Electrical Engineering 243

Title Advanced IC Processing and Layout
Units 3
Prerequisites 143 and either 140 or 141.
Description The key processes for the fabrication of integrated circuits. Optical, X-ray, and e-beam lithography, ion implantation, oxidation and diffusion. Thin film deposition. Wet and dry etching and ion milling. Effect of phase and defect equilibria on process control.
Sections Instructor Teaching Effectiveness How worthwhile was this course?
Spring 2014 Costas J. Spanos 4.7 / 7 5.2 / 7
Spring 2012 Nathan W. Cheung 5.6 / 7 5.6 / 7
Spring 2011 Nathan W. Cheung 6.2 / 7 6.5 / 7
Spring 2010 Nathan W. Cheung 5.9 / 7 5.8 / 7
Spring 2009 Nathan W. Cheung 5.7 / 7 6.2 / 7
Spring 2007 Clark Nguyen 6.2 / 7 5.7 / 7
Spring 2006 Andrew R. Neureuther 4.3 / 7 4.5 / 7
Spring 2005 Nathan W. Cheung 5.5 / 7 5.4 / 7
Spring 2004 Andrew R. Neureuther 5.1 / 7 5.2 / 7
Spring 2003 Andrew R. Neureuther 4.7 / 7 5.0 / 7
Spring 2002 Nathan W. Cheung 6.0 / 7 6.1 / 7
Fall 2000 Andrew R. Neureuther 4.2 / 7 5.6 / 7
Fall 1999 Nathan W. Cheung 5.8 / 7 6.3 / 7
Costas J. Spanos 5.7 / 7 6.1 / 7
Spring 1999 Nathan W. Cheung 5.6 / 7 5.8 / 7
Spring 1998 Nathan W. Cheung 5.8 / 7 6.0 / 7
Spring 1997 Nathan W. Cheung 6.0 / 7 6.2 / 7
Spring 1996 Nathan W. Cheung 5.5 / 7 5.3 / 7
Spring 1995 Nathan W. Cheung 6.2 / 7 6.5 / 7
Spring 1994 Andrew R. Neureuther 5.2 / 7 5.2 / 7
Spring 1993 Andrew R. Neureuther 5.6 / 7 6.0 / 7
Spring 1992 Nathan W. Cheung 5.8 / 7 5.8 / 7
Spring 1991 Nathan W. Cheung 5.8 / 7 5.7 / 7
Spring 1990 Andrew R. Neureuther 5.1 / 7 5.3 / 7
Spring 1989 Andrew R. Neureuther 4.7 / 7 4.8 / 7
Overall Rating Teaching Effectiveness How worthwhile was this course?
5.5 / 7 5.7 / 7
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