Electrical Engineering 243

Title	Advanced IC Processing and Layout
Units	3
Prerequisites	143 and either 140 or 141.
Description	The key processes for the fabrication of integrated circuits. Optical, X-ray, and e-beam lithography, ion implantation, oxidation and diffusion. Thin film deposition. Wet and dry etching and ion milling. Effect of phase and defect equilibria on process control.

Sections	Instructor	Teaching Effectiveness	How worthwhile was this course?
Spring 2014	Costas J. Spanos	4.7 / 7	5.2 / 7
Spring 2012	Nathan W. Cheung	5.6 / 7	5.6 / 7
Spring 2011	Nathan W. Cheung	6.2 / 7	6.5 / 7
Spring 2010	Nathan W. Cheung	5.9 / 7	5.8 / 7
Spring 2009	Nathan W. Cheung	5.7 / 7	6.2 / 7
Spring 2007	Clark Nguyen	6.2 / 7	5.7 / 7
Spring 2006	Andrew R. Neureuther	4.3 / 7	4.5 / 7
Spring 2005	Nathan W. Cheung	5.5 / 7	5.4 / 7
Spring 2004	Andrew R. Neureuther	5.1 / 7	5.2 / 7
Spring 2003	Andrew R. Neureuther	4.7 / 7	5.0 / 7
Spring 2002	Nathan W. Cheung	6.0 / 7	6.1 / 7
Fall 2000	Andrew R. Neureuther	4.2 / 7	5.6 / 7
Fall 1999	Nathan W. Cheung	5.8 / 7	6.3 / 7
Fall 1999	Costas J. Spanos	5.7 / 7	6.1 / 7
Spring 1999	Nathan W. Cheung	5.6 / 7	5.8 / 7
Spring 1998	Nathan W. Cheung	5.8 / 7	6.0 / 7
Spring 1997	Nathan W. Cheung	6.0 / 7	6.2 / 7
Spring 1996	Nathan W. Cheung	5.5 / 7	5.3 / 7
Spring 1995	Nathan W. Cheung	6.2 / 7	6.5 / 7
Spring 1994	Andrew R. Neureuther	5.2 / 7	5.2 / 7
Spring 1993	Andrew R. Neureuther	5.6 / 7	6.0 / 7
Spring 1992	Nathan W. Cheung	5.8 / 7	5.8 / 7
Spring 1991	Nathan W. Cheung	5.8 / 7	5.7 / 7
Spring 1990	Andrew R. Neureuther	5.1 / 7	5.3 / 7
Spring 1989	Andrew R. Neureuther	4.7 / 7	4.8 / 7
Overall Rating		Teaching Effectiveness	How worthwhile was this course?
		5.5 / 7	5.7 / 7