Electrical Engineering 243

Title	Advanced IC Processing and Layout
Units	3
Prerequisites	143 and either 140 or 141.
Description	The key processes for the fabrication of integrated circuits. Optical, X-ray, and e-beam lithography, ion implantation, oxidation and diffusion. Thin film deposition. Wet and dry etching and ion milling. Effect of phase and defect equilibria on process control.

Sections Instructor Teaching Effectiveness How worthwhile was this course?

Spring 2007 C Nguyen 6.2 / 7 ± 0.4
5.7 / 7 ± 0.7

Spring 2006 Neureuther 4.3 / 7 ± 0.9
4.5 / 7 ± 0.9

Spring 2005 Cheung 5.5 / 7 ± 0.5
5.4 / 7 ± 0.6

Spring 2004 Neureuther 5.1 / 7 ± 0.7
5.2 / 7 ± 0.6

Spring 2003 Neureuther 4.7 / 7 ± 0.6
5.0 / 7 ± 0.7

Spring 2002 Cheung 6.0 / 7 ± 0.5
6.1 / 7 ± 0.6

Fall 2000 Neureuther 4.2 / 7 ± 0.9
5.6 / 7 ± 0.5

Fall 1999 Cheung (1/2) 5.8 / 7 ± 0.3
6.3 / 7 ± 0.3

Fall 1999 Spanos (2/2) 5.7 / 7 ± 0.6
6.1 / 7 ± 0.4

Spring 1999 Cheung 5.6 / 7 ± 0.5
5.8 / 7 ± 0.6

Spring 1998 Cheung 5.8 / 7 ± 0.7
6.0 / 7 ± 0.8

Spring 1997 Cheung 6.0 / 7 ± 0.4
6.2 / 7 ± 0.5

Spring 1996 Cheung 5.5 / 7 ± 0.5
5.3 / 7 ± 0.6

Spring 1995 Cheung 6.2 / 7 ± 0.5
6.5 / 7 ± 0.4

Spring 1994 Neureuther 5.2 / 7 ± 0.8
5.2 / 7 ± 0.7

Spring 1993 Neureuther 5.6 / 7 ± 1.1
6.0 / 7 ± 0.9

Spring 1992 Cheung 5.8 / 7 ± 0.6
5.8 / 7 ± 0.8

Spring 1991 Cheung 5.8 / 7 ± 0.5
5.7 / 7 ± 0.4

Spring 1990 Neureuther 5.1 / 7 ± 0.8
5.3 / 7 ± 1.0

Spring 1989 Neureuther 4.7 / 7 ± 1.8
4.8 / 7 ± 1.7

Overall Rating Teaching Effectiveness How worthwhile was this course?

Electrical Engineering 243 5.4 / 7 ± 0.0
5.6 / 7 ± 0.0

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